ICP-MS and ICP-OES

21 listings from 14 suppliers · 4 Japanese makers

Japanese name: ICP-MS／ICP-OES（元素不純物・対イオン分析）

ICP-MS and ICP-OES instruments ionize a sample in plasma and measure its elements, quantifying metal catalyst residues and counterions at trace levels. They are standard tools for elemental impurity control under ICH Q3D. Buyers compare the detection limit they need, the interference removal method (collision cell or tandem MS) for hard-to-resolve elements, ICP-MS for trace work against ICP-OES for higher concentrations, throughput and automation, and argon running costs. Digestion systems and certified standards are listed too, with makers and Japanese sales channels.

“Where to buy in Japan” shows only sales relationships we have confirmed on the company’s or the distributor’s own website. “Not yet confirmed” means we have not checked yet, not that the product is unavailable in Japan. Product names link to the maker’s own page.